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Potentiometry Combined with Atomic Force Microscope

We have presented a novel method for surface potential measurement based on an atomic force microscope operating under the contact mode. This method is precise and exhibits sub-mV accuracy for potential measurement as well as nanometer-order spatial resolution. We show, for the first time, simultane...

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Bibliographic Details
Published in:Japanese Journal of Applied Physics 1994-11, Vol.33 (11A), p.L1562
Main Authors: Uchihashi, Takayuki, Fukano, Yoshinobu, Sugawara, Yasuhiro, Morita, Seizo, Nakano, Akihiko, Ida, Tohru, Okada, Takao
Format: Article
Language:English
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Summary:We have presented a novel method for surface potential measurement based on an atomic force microscope operating under the contact mode. This method is precise and exhibits sub-mV accuracy for potential measurement as well as nanometer-order spatial resolution. We show, for the first time, simultaneous measurements of the surface potential and surface actual topography on an ion-implanted silicon substrate with inhomogeneity of surface conductance.
ISSN:0021-4922
1347-4065
DOI:10.1143/JJAP.33.L1562