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Potentiometry Combined with Atomic Force Microscope
We have presented a novel method for surface potential measurement based on an atomic force microscope operating under the contact mode. This method is precise and exhibits sub-mV accuracy for potential measurement as well as nanometer-order spatial resolution. We show, for the first time, simultane...
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Published in: | Japanese Journal of Applied Physics 1994-11, Vol.33 (11A), p.L1562 |
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Main Authors: | , , , , , , |
Format: | Article |
Language: | English |
Citations: | Items that this one cites Items that cite this one |
Online Access: | Get full text |
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Summary: | We have presented a novel method for surface potential measurement based on an atomic force microscope operating under the contact mode. This method is precise and exhibits sub-mV accuracy for potential measurement as well as nanometer-order spatial resolution. We show, for the first time, simultaneous measurements of the surface potential and surface actual topography on an ion-implanted silicon substrate with inhomogeneity of surface conductance. |
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ISSN: | 0021-4922 1347-4065 |
DOI: | 10.1143/JJAP.33.L1562 |