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SiC/SiN multilayer membrane for X-ray mask deposited by low pressure chemical vapor deposition

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Bibliographic Details
Published in:	Japanese Journal of Applied Physics 1995, Vol.34 (12B), p.6701-6708
Main Authors:	OHTA, T, NODA, S, KASAI, M, HOGA, H
Format:	Article
Language:	English
Subjects:	Applied sciences Electronics Exact sciences and technology Microelectronic fabrication (materials and surfaces technology) Semiconductor electronics. Microelectronics. Optoelectronics. Solid state devices
Online Access:	Get full text
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