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S i O 2 / P o l y - S i Multilayered Electron Beam Resist Process for Fabrication of Ultrasmall Tunnel Junctions

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Bibliographic Details
Published in:	Japanese Journal of Applied Physics 1995-12, Vol.34 (Part 1, No. 12B), p.6961-6965
Main Authors:	Wada, Toshimi, Hirayama, Motoki, Haraichi, Satoshi, Ishii, Ken'ichi, Hiroshima, Hiroshi, Komuro, Masanori
Format:	Article
Language:	English
Citations:	Items that cite this one
Online Access:	Get full text
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