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Analytical calculation of subthreshold slope increase in short-channel MOSFET's by taking drift component into account

Modeling of the subthreshold slope S and the threshold voltage V T has been done based on the fundamental equations governing the metal-oxide-semiconductor field-effect transistor (MOSFET). Taking the drift as well as the diffusion component of the current into account resulted in a physically compl...

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Published in:Japanese Journal of Applied Physics 1995-02, Vol.34 (2B), p.917-920
Main Authors: BIESEMANS, S, DE MEYER, K
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Language:English
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cited_by cdi_FETCH-LOGICAL-c326t-df9e7b53660463c7498f884e774aa6f013878ec96b04bc4b5235866c2b41f0523
cites cdi_FETCH-LOGICAL-c326t-df9e7b53660463c7498f884e774aa6f013878ec96b04bc4b5235866c2b41f0523
container_end_page 920
container_issue 2B
container_start_page 917
container_title Japanese Journal of Applied Physics
container_volume 34
creator BIESEMANS, S
DE MEYER, K
description Modeling of the subthreshold slope S and the threshold voltage V T has been done based on the fundamental equations governing the metal-oxide-semiconductor field-effect transistor (MOSFET). Taking the drift as well as the diffusion component of the current into account resulted in a physically complete description of the short-channel effect. The method calculates the potential from the 2D Poisson equation, the minority carrier density from the continuity equation and the weak inversion current density from the drift-diffusion model. As an example, the detailed calculation of the S factor is given. The new closed-form formula for S includes the L dependence in an accurate way.
doi_str_mv 10.1143/jjap.34.917
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fullrecord <record><control><sourceid>pascalfrancis_cross</sourceid><recordid>TN_cdi_crossref_primary_10_1143_JJAP_34_917</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><sourcerecordid>3473551</sourcerecordid><originalsourceid>FETCH-LOGICAL-c326t-df9e7b53660463c7498f884e774aa6f013878ec96b04bc4b5235866c2b41f0523</originalsourceid><addsrcrecordid>eNo9kEtLAzEUhYMoWKsr_0AWgguZmkweM7MsxVepVFDXQ5ImNjVNhiQV-u9Nqbi43Hsu55zFB8A1RhOMKbnfbMQwIXTS4eYEjDChTUURZ6dghFCNK9rV9Tm4SGlTJGcUj8DP1Au3z1YJB8uonRPZBg-DgWkn8zrqtA5uBZMLg4bWq6hFOhyw_GOu1Fp4rx18Xb4_PnzcJij3MItv67_gKlqToQrbIXjtc8nkAIVSYefzJTgzwiV99bfH4LPEZ8_VYvn0MpsuKkVqnquV6XQjGeEcUU5UQ7vWtC3VTUOF4AZh0jatVh2XiEpFJasJazlXtaTYoKLG4O7Yq2JIKWrTD9FuRdz3GPUHZP18Pn3rCe0LsuK-OboHkQoME4VXNv1HCk7CGCa_4c5s7A</addsrcrecordid><sourcetype>Aggregation Database</sourcetype><iscdi>true</iscdi><recordtype>article</recordtype></control><display><type>article</type><title>Analytical calculation of subthreshold slope increase in short-channel MOSFET's by taking drift component into account</title><source>Institute of Physics</source><source>Institute of Physics:Jisc Collections:IOP Publishing Read and Publish 2024-2025 (Reading List)</source><creator>BIESEMANS, S ; DE MEYER, K</creator><creatorcontrib>BIESEMANS, S ; DE MEYER, K</creatorcontrib><description>Modeling of the subthreshold slope S and the threshold voltage V T has been done based on the fundamental equations governing the metal-oxide-semiconductor field-effect transistor (MOSFET). Taking the drift as well as the diffusion component of the current into account resulted in a physically complete description of the short-channel effect. The method calculates the potential from the 2D Poisson equation, the minority carrier density from the continuity equation and the weak inversion current density from the drift-diffusion model. As an example, the detailed calculation of the S factor is given. The new closed-form formula for S includes the L dependence in an accurate way.</description><identifier>ISSN: 0021-4922</identifier><identifier>EISSN: 1347-4065</identifier><identifier>DOI: 10.1143/jjap.34.917</identifier><identifier>CODEN: JJAPA5</identifier><language>eng</language><publisher>Tokyo: Japanese journal of applied physics</publisher><subject>Applied sciences ; Electronics ; Exact sciences and technology ; Semiconductor electronics. Microelectronics. Optoelectronics. Solid state devices ; Transistors</subject><ispartof>Japanese Journal of Applied Physics, 1995-02, Vol.34 (2B), p.917-920</ispartof><rights>1995 INIST-CNRS</rights><lds50>peer_reviewed</lds50><woscitedreferencessubscribed>false</woscitedreferencessubscribed><citedby>FETCH-LOGICAL-c326t-df9e7b53660463c7498f884e774aa6f013878ec96b04bc4b5235866c2b41f0523</citedby><cites>FETCH-LOGICAL-c326t-df9e7b53660463c7498f884e774aa6f013878ec96b04bc4b5235866c2b41f0523</cites></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><link.rule.ids>309,310,314,777,781,786,787,23911,23912,25121,27905,27906</link.rule.ids><backlink>$$Uhttp://pascal-francis.inist.fr/vibad/index.php?action=getRecordDetail&amp;idt=3473551$$DView record in Pascal Francis$$Hfree_for_read</backlink></links><search><creatorcontrib>BIESEMANS, S</creatorcontrib><creatorcontrib>DE MEYER, K</creatorcontrib><title>Analytical calculation of subthreshold slope increase in short-channel MOSFET's by taking drift component into account</title><title>Japanese Journal of Applied Physics</title><description>Modeling of the subthreshold slope S and the threshold voltage V T has been done based on the fundamental equations governing the metal-oxide-semiconductor field-effect transistor (MOSFET). Taking the drift as well as the diffusion component of the current into account resulted in a physically complete description of the short-channel effect. The method calculates the potential from the 2D Poisson equation, the minority carrier density from the continuity equation and the weak inversion current density from the drift-diffusion model. As an example, the detailed calculation of the S factor is given. The new closed-form formula for S includes the L dependence in an accurate way.</description><subject>Applied sciences</subject><subject>Electronics</subject><subject>Exact sciences and technology</subject><subject>Semiconductor electronics. Microelectronics. Optoelectronics. Solid state devices</subject><subject>Transistors</subject><issn>0021-4922</issn><issn>1347-4065</issn><fulltext>true</fulltext><rsrctype>article</rsrctype><creationdate>1995</creationdate><recordtype>article</recordtype><recordid>eNo9kEtLAzEUhYMoWKsr_0AWgguZmkweM7MsxVepVFDXQ5ImNjVNhiQV-u9Nqbi43Hsu55zFB8A1RhOMKbnfbMQwIXTS4eYEjDChTUURZ6dghFCNK9rV9Tm4SGlTJGcUj8DP1Au3z1YJB8uonRPZBg-DgWkn8zrqtA5uBZMLg4bWq6hFOhyw_GOu1Fp4rx18Xb4_PnzcJij3MItv67_gKlqToQrbIXjtc8nkAIVSYefzJTgzwiV99bfH4LPEZ8_VYvn0MpsuKkVqnquV6XQjGeEcUU5UQ7vWtC3VTUOF4AZh0jatVh2XiEpFJasJazlXtaTYoKLG4O7Yq2JIKWrTD9FuRdz3GPUHZP18Pn3rCe0LsuK-OboHkQoME4VXNv1HCk7CGCa_4c5s7A</recordid><startdate>19950201</startdate><enddate>19950201</enddate><creator>BIESEMANS, S</creator><creator>DE MEYER, K</creator><general>Japanese journal of applied physics</general><scope>IQODW</scope><scope>AAYXX</scope><scope>CITATION</scope></search><sort><creationdate>19950201</creationdate><title>Analytical calculation of subthreshold slope increase in short-channel MOSFET's by taking drift component into account</title><author>BIESEMANS, S ; DE MEYER, K</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-LOGICAL-c326t-df9e7b53660463c7498f884e774aa6f013878ec96b04bc4b5235866c2b41f0523</frbrgroupid><rsrctype>articles</rsrctype><prefilter>articles</prefilter><language>eng</language><creationdate>1995</creationdate><topic>Applied sciences</topic><topic>Electronics</topic><topic>Exact sciences and technology</topic><topic>Semiconductor electronics. Microelectronics. Optoelectronics. Solid state devices</topic><topic>Transistors</topic><toplevel>peer_reviewed</toplevel><toplevel>online_resources</toplevel><creatorcontrib>BIESEMANS, S</creatorcontrib><creatorcontrib>DE MEYER, K</creatorcontrib><collection>Pascal-Francis</collection><collection>CrossRef</collection><jtitle>Japanese Journal of Applied Physics</jtitle></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext</fulltext></delivery><addata><au>BIESEMANS, S</au><au>DE MEYER, K</au><format>journal</format><genre>article</genre><ristype>JOUR</ristype><atitle>Analytical calculation of subthreshold slope increase in short-channel MOSFET's by taking drift component into account</atitle><jtitle>Japanese Journal of Applied Physics</jtitle><date>1995-02-01</date><risdate>1995</risdate><volume>34</volume><issue>2B</issue><spage>917</spage><epage>920</epage><pages>917-920</pages><issn>0021-4922</issn><eissn>1347-4065</eissn><coden>JJAPA5</coden><abstract>Modeling of the subthreshold slope S and the threshold voltage V T has been done based on the fundamental equations governing the metal-oxide-semiconductor field-effect transistor (MOSFET). Taking the drift as well as the diffusion component of the current into account resulted in a physically complete description of the short-channel effect. The method calculates the potential from the 2D Poisson equation, the minority carrier density from the continuity equation and the weak inversion current density from the drift-diffusion model. As an example, the detailed calculation of the S factor is given. The new closed-form formula for S includes the L dependence in an accurate way.</abstract><cop>Tokyo</cop><pub>Japanese journal of applied physics</pub><doi>10.1143/jjap.34.917</doi><tpages>4</tpages></addata></record>
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issn 0021-4922
1347-4065
language eng
recordid cdi_crossref_primary_10_1143_JJAP_34_917
source Institute of Physics; Institute of Physics:Jisc Collections:IOP Publishing Read and Publish 2024-2025 (Reading List)
subjects Applied sciences
Electronics
Exact sciences and technology
Semiconductor electronics. Microelectronics. Optoelectronics. Solid state devices
Transistors
title Analytical calculation of subthreshold slope increase in short-channel MOSFET's by taking drift component into account
url http://sfxeu10.hosted.exlibrisgroup.com/loughborough?ctx_ver=Z39.88-2004&ctx_enc=info:ofi/enc:UTF-8&ctx_tim=2025-01-20T03%3A01%3A06IST&url_ver=Z39.88-2004&url_ctx_fmt=infofi/fmt:kev:mtx:ctx&rfr_id=info:sid/primo.exlibrisgroup.com:primo3-Article-pascalfrancis_cross&rft_val_fmt=info:ofi/fmt:kev:mtx:journal&rft.genre=article&rft.atitle=Analytical%20calculation%20of%20subthreshold%20slope%20increase%20in%20short-channel%20MOSFET's%20by%20taking%20drift%20component%20into%20account&rft.jtitle=Japanese%20Journal%20of%20Applied%20Physics&rft.au=BIESEMANS,%20S&rft.date=1995-02-01&rft.volume=34&rft.issue=2B&rft.spage=917&rft.epage=920&rft.pages=917-920&rft.issn=0021-4922&rft.eissn=1347-4065&rft.coden=JJAPA5&rft_id=info:doi/10.1143/jjap.34.917&rft_dat=%3Cpascalfrancis_cross%3E3473551%3C/pascalfrancis_cross%3E%3Cgrp_id%3Ecdi_FETCH-LOGICAL-c326t-df9e7b53660463c7498f884e774aa6f013878ec96b04bc4b5235866c2b41f0523%3C/grp_id%3E%3Coa%3E%3C/oa%3E%3Curl%3E%3C/url%3E&rft_id=info:oai/&rft_id=info:pmid/&rfr_iscdi=true