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Characterization of niobium-doped lead titanate thin films

Lead titanate ( PbTiO 3 ) thin films were deposited on silicon substrates covered with platinum by reactive sputtering using a single multicomponent-type target at high temperatures (around 500° C). Small chips of metallic niobium were incorporated into the target for doping purposes. Samples analyz...

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Bibliographic Details
Published in:Japanese Journal of Applied Physics 1996-09, Vol.35 (9B), p.4995-4998
Main Authors: IBRAHIM, R. C, SAKAI, T, NISHIDA, T, HORIUCHI, T, SHIOSAKI, T, MATSUSHIGE, K
Format: Article
Language:English
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Summary:Lead titanate ( PbTiO 3 ) thin films were deposited on silicon substrates covered with platinum by reactive sputtering using a single multicomponent-type target at high temperatures (around 500° C). Small chips of metallic niobium were incorporated into the target for doping purposes. Samples analyzed in this study were fabricated in such a way that the molar concentration of niobium was kept at 0, 1, 2, 3, or 4%. X-ray diffraction (XRD) patterns showed that samples doped with niobium tended to exhibit epitaxial growth on top of a (111)-oriented platinum electrode. At 2 mol% niobium doping, the tetragonality ratio ( c / a ) exhibited a maximum value and the dielectric permittivity showed a local minimum. The dielectric loss and leakage current characteristics of Nb-doped films were considerably improved. Electric displacement-electric field ( D - E ) hysteresis loops were observed at all doping concentrations. Some promising acoustic surface wave characteristics were also observed. Samples with 1 or 2 mol%Nb seem to be very promising candidates for integrated devices.
ISSN:0021-4922
1347-4065
DOI:10.1143/jjap.35.4995