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Characterization of niobium-doped lead titanate thin films
Lead titanate ( PbTiO 3 ) thin films were deposited on silicon substrates covered with platinum by reactive sputtering using a single multicomponent-type target at high temperatures (around 500° C). Small chips of metallic niobium were incorporated into the target for doping purposes. Samples analyz...
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Published in: | Japanese Journal of Applied Physics 1996-09, Vol.35 (9B), p.4995-4998 |
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Main Authors: | , , , , , |
Format: | Article |
Language: | English |
Subjects: | |
Citations: | Items that this one cites Items that cite this one |
Online Access: | Get full text |
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Summary: | Lead titanate ( PbTiO
3
) thin films were deposited on silicon substrates covered with
platinum by reactive sputtering using a single multicomponent-type target at high temperatures
(around 500° C). Small chips of metallic niobium were incorporated into the target for doping
purposes. Samples analyzed in this study were fabricated in such a way that the molar
concentration of niobium was kept at 0, 1, 2, 3, or 4%. X-ray diffraction (XRD) patterns
showed that samples doped with niobium tended to exhibit epitaxial growth on top of a (111)-oriented platinum electrode. At 2 mol% niobium doping, the tetragonality ratio (
c
/
a
) exhibited a
maximum value and the dielectric permittivity showed a local minimum. The dielectric loss and
leakage current characteristics of Nb-doped films were considerably improved. Electric
displacement-electric field (
D
-
E
) hysteresis loops were observed at all doping concentrations.
Some promising acoustic surface wave characteristics were also observed. Samples with 1 or 2 mol%Nb seem to be very promising candidates for integrated devices. |
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ISSN: | 0021-4922 1347-4065 |
DOI: | 10.1143/jjap.35.4995 |