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Characterization of niobium-doped lead titanate thin films
Lead titanate ( PbTiO 3 ) thin films were deposited on silicon substrates covered with platinum by reactive sputtering using a single multicomponent-type target at high temperatures (around 500° C). Small chips of metallic niobium were incorporated into the target for doping purposes. Samples analyz...
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Published in: | Japanese Journal of Applied Physics 1996-09, Vol.35 (9B), p.4995-4998 |
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container_end_page | 4998 |
container_issue | 9B |
container_start_page | 4995 |
container_title | Japanese Journal of Applied Physics |
container_volume | 35 |
creator | IBRAHIM, R. C SAKAI, T NISHIDA, T HORIUCHI, T SHIOSAKI, T MATSUSHIGE, K |
description | Lead titanate ( PbTiO
3
) thin films were deposited on silicon substrates covered with
platinum by reactive sputtering using a single multicomponent-type target at high temperatures
(around 500° C). Small chips of metallic niobium were incorporated into the target for doping
purposes. Samples analyzed in this study were fabricated in such a way that the molar
concentration of niobium was kept at 0, 1, 2, 3, or 4%. X-ray diffraction (XRD) patterns
showed that samples doped with niobium tended to exhibit epitaxial growth on top of a (111)-oriented platinum electrode. At 2 mol% niobium doping, the tetragonality ratio (
c
/
a
) exhibited a
maximum value and the dielectric permittivity showed a local minimum. The dielectric loss and
leakage current characteristics of Nb-doped films were considerably improved. Electric
displacement-electric field (
D
-
E
) hysteresis loops were observed at all doping concentrations.
Some promising acoustic surface wave characteristics were also observed. Samples with 1 or 2 mol%Nb seem to be very promising candidates for integrated devices. |
doi_str_mv | 10.1143/jjap.35.4995 |
format | article |
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3
) thin films were deposited on silicon substrates covered with
platinum by reactive sputtering using a single multicomponent-type target at high temperatures
(around 500° C). Small chips of metallic niobium were incorporated into the target for doping
purposes. Samples analyzed in this study were fabricated in such a way that the molar
concentration of niobium was kept at 0, 1, 2, 3, or 4%. X-ray diffraction (XRD) patterns
showed that samples doped with niobium tended to exhibit epitaxial growth on top of a (111)-oriented platinum electrode. At 2 mol% niobium doping, the tetragonality ratio (
c
/
a
) exhibited a
maximum value and the dielectric permittivity showed a local minimum. The dielectric loss and
leakage current characteristics of Nb-doped films were considerably improved. Electric
displacement-electric field (
D
-
E
) hysteresis loops were observed at all doping concentrations.
Some promising acoustic surface wave characteristics were also observed. Samples with 1 or 2 mol%Nb seem to be very promising candidates for integrated devices.</description><identifier>ISSN: 0021-4922</identifier><identifier>EISSN: 1347-4065</identifier><identifier>DOI: 10.1143/jjap.35.4995</identifier><identifier>CODEN: JJAPA5</identifier><language>eng</language><publisher>Tokyo: Japanese journal of applied physics</publisher><subject>Condensed matter: electronic structure, electrical, magnetic, and optical properties ; Condensed matter: structure, mechanical and thermal properties ; Dielectric properties of solids and liquids ; Dielectric, piezoelectric, ferroelectric and antiferroelectric materials ; Dielectrics, piezoelectrics, and ferroelectrics and their properties ; Exact sciences and technology ; Niobates, titanates, tantalates, pzt ceramics, etc ; Physics ; Surfaces and interfaces; thin films and whiskers (structure and nonelectronic properties) ; Thin film structure and morphology</subject><ispartof>Japanese Journal of Applied Physics, 1996-09, Vol.35 (9B), p.4995-4998</ispartof><rights>1996 INIST-CNRS</rights><lds50>peer_reviewed</lds50><woscitedreferencessubscribed>false</woscitedreferencessubscribed><citedby>FETCH-LOGICAL-c410t-3d3f9ec7d9968b32ba4e5411c066378e2fcc2ff92b265162d506c80d33d347f3</citedby><cites>FETCH-LOGICAL-c410t-3d3f9ec7d9968b32ba4e5411c066378e2fcc2ff92b265162d506c80d33d347f3</cites></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><link.rule.ids>309,310,314,780,784,789,790,23930,23931,25140,27924,27925</link.rule.ids><backlink>$$Uhttp://pascal-francis.inist.fr/vibad/index.php?action=getRecordDetail&idt=3258584$$DView record in Pascal Francis$$Hfree_for_read</backlink></links><search><creatorcontrib>IBRAHIM, R. C</creatorcontrib><creatorcontrib>SAKAI, T</creatorcontrib><creatorcontrib>NISHIDA, T</creatorcontrib><creatorcontrib>HORIUCHI, T</creatorcontrib><creatorcontrib>SHIOSAKI, T</creatorcontrib><creatorcontrib>MATSUSHIGE, K</creatorcontrib><title>Characterization of niobium-doped lead titanate thin films</title><title>Japanese Journal of Applied Physics</title><description>Lead titanate ( PbTiO
3
) thin films were deposited on silicon substrates covered with
platinum by reactive sputtering using a single multicomponent-type target at high temperatures
(around 500° C). Small chips of metallic niobium were incorporated into the target for doping
purposes. Samples analyzed in this study were fabricated in such a way that the molar
concentration of niobium was kept at 0, 1, 2, 3, or 4%. X-ray diffraction (XRD) patterns
showed that samples doped with niobium tended to exhibit epitaxial growth on top of a (111)-oriented platinum electrode. At 2 mol% niobium doping, the tetragonality ratio (
c
/
a
) exhibited a
maximum value and the dielectric permittivity showed a local minimum. The dielectric loss and
leakage current characteristics of Nb-doped films were considerably improved. Electric
displacement-electric field (
D
-
E
) hysteresis loops were observed at all doping concentrations.
Some promising acoustic surface wave characteristics were also observed. Samples with 1 or 2 mol%Nb seem to be very promising candidates for integrated devices.</description><subject>Condensed matter: electronic structure, electrical, magnetic, and optical properties</subject><subject>Condensed matter: structure, mechanical and thermal properties</subject><subject>Dielectric properties of solids and liquids</subject><subject>Dielectric, piezoelectric, ferroelectric and antiferroelectric materials</subject><subject>Dielectrics, piezoelectrics, and ferroelectrics and their properties</subject><subject>Exact sciences and technology</subject><subject>Niobates, titanates, tantalates, pzt ceramics, etc</subject><subject>Physics</subject><subject>Surfaces and interfaces; thin films and whiskers (structure and nonelectronic properties)</subject><subject>Thin film structure and morphology</subject><issn>0021-4922</issn><issn>1347-4065</issn><fulltext>true</fulltext><rsrctype>article</rsrctype><creationdate>1996</creationdate><recordtype>article</recordtype><recordid>eNo9T0lLw0AYHUTBWr35A3LwaOLsyXgrwaqloIfew5dZ6IRszIwH_fWmVDw9HrwVoXuCC0I4e-o6mAsmCq6UuEArwniZcyzFJVphTEnOFaXX6CbGbqFScLJCz_URAuhkg_-B5Kcxm1w2-qn1X0NuptmarLdgsuQTjJBslo5-zJzvh3iLrhz00d794Rodti-H-i3ff7y-15t9rjnBKWeGOWV1aZSSVctoC9wu1URjKVlZWeq0ps4p2i6TiKRGYKkrbNhi5KVja_R4jtVhijFY18zBDxC-G4Kb0-1mt9t8Nkw0p9uL_OEsnyFq6F2AUfv472FUVKLi7Bd841dz</recordid><startdate>19960901</startdate><enddate>19960901</enddate><creator>IBRAHIM, R. C</creator><creator>SAKAI, T</creator><creator>NISHIDA, T</creator><creator>HORIUCHI, T</creator><creator>SHIOSAKI, T</creator><creator>MATSUSHIGE, K</creator><general>Japanese journal of applied physics</general><scope>IQODW</scope><scope>AAYXX</scope><scope>CITATION</scope></search><sort><creationdate>19960901</creationdate><title>Characterization of niobium-doped lead titanate thin films</title><author>IBRAHIM, R. C ; SAKAI, T ; NISHIDA, T ; HORIUCHI, T ; SHIOSAKI, T ; MATSUSHIGE, K</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-LOGICAL-c410t-3d3f9ec7d9968b32ba4e5411c066378e2fcc2ff92b265162d506c80d33d347f3</frbrgroupid><rsrctype>articles</rsrctype><prefilter>articles</prefilter><language>eng</language><creationdate>1996</creationdate><topic>Condensed matter: electronic structure, electrical, magnetic, and optical properties</topic><topic>Condensed matter: structure, mechanical and thermal properties</topic><topic>Dielectric properties of solids and liquids</topic><topic>Dielectric, piezoelectric, ferroelectric and antiferroelectric materials</topic><topic>Dielectrics, piezoelectrics, and ferroelectrics and their properties</topic><topic>Exact sciences and technology</topic><topic>Niobates, titanates, tantalates, pzt ceramics, etc</topic><topic>Physics</topic><topic>Surfaces and interfaces; thin films and whiskers (structure and nonelectronic properties)</topic><topic>Thin film structure and morphology</topic><toplevel>peer_reviewed</toplevel><toplevel>online_resources</toplevel><creatorcontrib>IBRAHIM, R. C</creatorcontrib><creatorcontrib>SAKAI, T</creatorcontrib><creatorcontrib>NISHIDA, T</creatorcontrib><creatorcontrib>HORIUCHI, T</creatorcontrib><creatorcontrib>SHIOSAKI, T</creatorcontrib><creatorcontrib>MATSUSHIGE, K</creatorcontrib><collection>Pascal-Francis</collection><collection>CrossRef</collection><jtitle>Japanese Journal of Applied Physics</jtitle></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext</fulltext></delivery><addata><au>IBRAHIM, R. C</au><au>SAKAI, T</au><au>NISHIDA, T</au><au>HORIUCHI, T</au><au>SHIOSAKI, T</au><au>MATSUSHIGE, K</au><format>journal</format><genre>article</genre><ristype>JOUR</ristype><atitle>Characterization of niobium-doped lead titanate thin films</atitle><jtitle>Japanese Journal of Applied Physics</jtitle><date>1996-09-01</date><risdate>1996</risdate><volume>35</volume><issue>9B</issue><spage>4995</spage><epage>4998</epage><pages>4995-4998</pages><issn>0021-4922</issn><eissn>1347-4065</eissn><coden>JJAPA5</coden><abstract>Lead titanate ( PbTiO
3
) thin films were deposited on silicon substrates covered with
platinum by reactive sputtering using a single multicomponent-type target at high temperatures
(around 500° C). Small chips of metallic niobium were incorporated into the target for doping
purposes. Samples analyzed in this study were fabricated in such a way that the molar
concentration of niobium was kept at 0, 1, 2, 3, or 4%. X-ray diffraction (XRD) patterns
showed that samples doped with niobium tended to exhibit epitaxial growth on top of a (111)-oriented platinum electrode. At 2 mol% niobium doping, the tetragonality ratio (
c
/
a
) exhibited a
maximum value and the dielectric permittivity showed a local minimum. The dielectric loss and
leakage current characteristics of Nb-doped films were considerably improved. Electric
displacement-electric field (
D
-
E
) hysteresis loops were observed at all doping concentrations.
Some promising acoustic surface wave characteristics were also observed. Samples with 1 or 2 mol%Nb seem to be very promising candidates for integrated devices.</abstract><cop>Tokyo</cop><pub>Japanese journal of applied physics</pub><doi>10.1143/jjap.35.4995</doi><tpages>4</tpages></addata></record> |
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source | Institute of Physics IOPscience extra; Institute of Physics |
subjects | Condensed matter: electronic structure, electrical, magnetic, and optical properties Condensed matter: structure, mechanical and thermal properties Dielectric properties of solids and liquids Dielectric, piezoelectric, ferroelectric and antiferroelectric materials Dielectrics, piezoelectrics, and ferroelectrics and their properties Exact sciences and technology Niobates, titanates, tantalates, pzt ceramics, etc Physics Surfaces and interfaces thin films and whiskers (structure and nonelectronic properties) Thin film structure and morphology |
title | Characterization of niobium-doped lead titanate thin films |
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