Surface Properties of a YBa 2 Cu 3 O 7-δ Thin Film After Photo-Lithographic Treatment

The effect of photolithographic treatments on the surface of a YBa 2 Cu 3 O 7-δ thin film has been investigated by measuring the electrical contact resistance and performing X-ray photoemission spectroscopy (XPS) experiment. Water plays an important role in increasing the electrical contact resistan...

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Bibliographic Details
Published in:Japanese Journal of Applied Physics 1998-05, Vol.37 (5R), p.2478
Main Authors: Huh, Yunsung, Kim, Jin-Tae, Hwang, Yunseok, Park, Yongsup, So, Youngjin, Kim, In-Seon, Lee, Soon-Gul, Park, Gwangseo, Park, Yong Ki, Park, Jong-Chul
Format: Article
Language:English
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Summary:The effect of photolithographic treatments on the surface of a YBa 2 Cu 3 O 7-δ thin film has been investigated by measuring the electrical contact resistance and performing X-ray photoemission spectroscopy (XPS) experiment. Water plays an important role in increasing the electrical contact resistance of the YBa 2 Cu 3 O 7-δ thin film, as compared with the developer and photoresist (PR); water removes oxygen from the surface and increases the contact resistance. The chemical interaction with the PR or developer is not a key element in increasing the contact resistance. XPS spectra show that the oxygen concentration of the surface of a YBa 2 Cu 3 O 7-δ thin film is reduced after the photolithographic process.
ISSN:0021-4922
1347-4065
DOI:10.1143/JJAP.37.2478