Atomic Force Microscope Based Nanolithography of Self-Assembled Organosilane Monolayer Resists

Atomic force microscope (AFM) has been used to investigate organosilane self-assembled monolayer films (SAMs) for nanometer-scale lithography. The octadecyldimethylmethoxysilane monolayer as a resist was prepared on a Si substrate by using the immersion method. Patterning was accomplished through th...

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Bibliographic Details
Published in:Japanese Journal of Applied Physics 1998-12, Vol.37 (12S), p.7148
Main Authors: Kim, Jinchul, Oh, Young, Shin, HaiwonLee, SunwooPark, SunwooPark
Format: Article
Language:English
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Summary:Atomic force microscope (AFM) has been used to investigate organosilane self-assembled monolayer films (SAMs) for nanometer-scale lithography. The octadecyldimethylmethoxysilane monolayer as a resist was prepared on a Si substrate by using the immersion method. Patterning was accomplished through the localized degradation of the monolayer as a result of anodic reaction induced by an AFM tip. When the negative bias voltage was 10–30 V, the protruding lines appeared in the exposed regions and the minimum linewidth was 70 nm. The pattern fabricated on the monolayer was transferred to the Si substrate by chemical etching in buffered oxide etch (BOE) solution. The etching proceeded area selectively in the regions where the probe had passed, while the surrounding area remained unetched due to the resistivity of the undegraded monolayer to the etching.
ISSN:0021-4922
1347-4065
DOI:10.1143/JJAP.37.7148