Analysis of an Oxygen Dissolution Process Concerning Czochralski (CZ) Si Crystal Growth using the Sessile Drop Method

A new sessile drop method has been developed for measuring the oxygen dissolution rate from silica glass to silicon melt. Compared to the oxygen dissolution rate obtained using a conventional measurement method, a much larger value has been obtained with the sessile drop method. The experimental acc...

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Bibliographic Details
Published in:Japanese Journal of Applied Physics 1998-02, Vol.37 (2B), p.L193
Main Authors: Huang, Xinming, Saitou, Keijirou, Sakai, Susumu, Terashima, Kazutaka, Hoshikawa, Keigo
Format: Article
Language:English
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Summary:A new sessile drop method has been developed for measuring the oxygen dissolution rate from silica glass to silicon melt. Compared to the oxygen dissolution rate obtained using a conventional measurement method, a much larger value has been obtained with the sessile drop method. The experimental accuracy of the sessile drop method was analyzed, and it was found that the main error resulted from the weight change of a blank silica plate following heat treatment. A rectification method was suggested.
ISSN:0021-4922
1347-4065
DOI:10.1143/JJAP.37.L193