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Atomic-Scale Electron Beam Processing
Atomic-scale electron beam processing was demonstrated using high-resolution transmission electron microscopy. Nanometer-size holes were produced through mag nesium oxide films. The minimum hole size was 0.84 nm and the minimum distance between the holes was 0.63 nm.
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Published in: | Japanese Journal of Applied Physics 1999, Vol.38 (3R), p.1595 |
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Main Authors: | , |
Format: | Article |
Language: | English |
Citations: | Items that this one cites Items that cite this one |
Online Access: | Get full text |
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Summary: | Atomic-scale electron beam processing was demonstrated using high-resolution
transmission electron microscopy. Nanometer-size holes were produced through mag
nesium
oxide films. The minimum hole size was 0.84 nm and the minimum distance between
the
holes was 0.63 nm. |
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ISSN: | 0021-4922 1347-4065 |
DOI: | 10.1143/JJAP.38.1595 |