In Situ Growth Monitoring During Metalorganic Chemical Vapor Deposition of YBa 2 Cu 3 O x Thin Films by Spectroscopic Ellipsometry

We have investigated in situ spectroscopic ellipsometry in the case of atomic layer-by-layer metalorganic chemical vapor deposition of YBa 2 Cu 3 O x (YBCO) thin films. We have demonstrated the effectiveness of spectroscopic measurement from the relationship between the film properties and trajector...

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Bibliographic Details
Published in:Japanese Journal of Applied Physics 1999-06, Vol.38 (6A), p.L632
Main Authors: Shuu'ichirou Yamamoto, Shuu'ichirou Yamamoto, Satoshi Sugai, Satoshi Sugai, Yasunari Matsukawa, Yasunari Matsukawa, Akio Sengoku, Akio Sengoku, Hiroshi Tobisaka, Hiroshi Tobisaka, Takeo Hattori, Takeo Hattori, Shunri Oda, Shunri Oda
Format: Article
Language:English
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Summary:We have investigated in situ spectroscopic ellipsometry in the case of atomic layer-by-layer metalorganic chemical vapor deposition of YBa 2 Cu 3 O x (YBCO) thin films. We have demonstrated the effectiveness of spectroscopic measurement from the relationship between the film properties and trajectories of the pseudodielectric function of YBCO thin films deposited on SrTiO 3 substrates. We have also demonstrated, in detail, how high-quality crystalline YBCO, formed in the initial growth stage, can be obtained from the imaginary part of the pseudodielectric function around 4.1 eV. Superconductivity of YBCO films can be estimated during film deposition using optical measurements.
ISSN:0021-4922
1347-4065
DOI:10.1143/JJAP.38.L632