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Laser Cleaning of IC Mould and Its Real-Time Monitoring
Laser-induced removal of organic contaminants on IC mould surfaces was studied both experimentally and theoretically. The mould surfaces before and after cleaning were observed under an optical microscope and analysed by Auger electron spectroscopy (AES). It was found that the contaminants in the ir...
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Published in: | Japanese Journal of Applied Physics 2000-08, Vol.39 (8R), p.4811 |
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container_issue | 8R |
container_start_page | 4811 |
container_title | Japanese Journal of Applied Physics |
container_volume | 39 |
creator | Lu, Yong-Feng Song, Wen-Dong Hong, Ming-Hui Ren, Zhong-Min Chen, Qiong Chong, Tow-Chong |
description | Laser-induced removal of organic contaminants on IC mould surfaces was studied both experimentally and theoretically. The mould surfaces before and after cleaning were observed under an optical microscope and analysed by Auger electron spectroscopy (AES). It was found that the contaminants in the irradiated area were effectively removed by pulsed laser irradiation at a laser fluence greater than the cleaning threshold of 100 mJ/cm
2
. The cleaning efficiency increases with increasing laser fluence and the damage threshold of the mould surfaces is about 1.05 J/cm
2
, which is in good agreement with the theoretical damage threshold. We also demonstrated that the acoustic wave detection in real-time can be used to both monitor the surface cleanness during the laser cleaning process and determine the cleaning threshold and cleaning efficiency. |
doi_str_mv | 10.1143/JJAP.39.4811 |
format | article |
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2
. The cleaning efficiency increases with increasing laser fluence and the damage threshold of the mould surfaces is about 1.05 J/cm
2
, which is in good agreement with the theoretical damage threshold. We also demonstrated that the acoustic wave detection in real-time can be used to both monitor the surface cleanness during the laser cleaning process and determine the cleaning threshold and cleaning efficiency.</description><identifier>ISSN: 0021-4922</identifier><identifier>EISSN: 1347-4065</identifier><identifier>DOI: 10.1143/JJAP.39.4811</identifier><language>eng</language><ispartof>Japanese Journal of Applied Physics, 2000-08, Vol.39 (8R), p.4811</ispartof><lds50>peer_reviewed</lds50><woscitedreferencessubscribed>false</woscitedreferencessubscribed><citedby>FETCH-LOGICAL-c299t-cac5241dde01316ec402844ba3676cbaee1721a9a2f8bc89096c04d28c57b23b3</citedby><cites>FETCH-LOGICAL-c299t-cac5241dde01316ec402844ba3676cbaee1721a9a2f8bc89096c04d28c57b23b3</cites></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><link.rule.ids>314,777,781,27905,27906</link.rule.ids></links><search><creatorcontrib>Lu, Yong-Feng</creatorcontrib><creatorcontrib>Song, Wen-Dong</creatorcontrib><creatorcontrib>Hong, Ming-Hui</creatorcontrib><creatorcontrib>Ren, Zhong-Min</creatorcontrib><creatorcontrib>Chen, Qiong</creatorcontrib><creatorcontrib>Chong, Tow-Chong</creatorcontrib><title>Laser Cleaning of IC Mould and Its Real-Time Monitoring</title><title>Japanese Journal of Applied Physics</title><description>Laser-induced removal of organic contaminants on IC mould surfaces was studied both experimentally and theoretically. The mould surfaces before and after cleaning were observed under an optical microscope and analysed by Auger electron spectroscopy (AES). It was found that the contaminants in the irradiated area were effectively removed by pulsed laser irradiation at a laser fluence greater than the cleaning threshold of 100 mJ/cm
2
. The cleaning efficiency increases with increasing laser fluence and the damage threshold of the mould surfaces is about 1.05 J/cm
2
, which is in good agreement with the theoretical damage threshold. We also demonstrated that the acoustic wave detection in real-time can be used to both monitor the surface cleanness during the laser cleaning process and determine the cleaning threshold and cleaning efficiency.</description><issn>0021-4922</issn><issn>1347-4065</issn><fulltext>true</fulltext><rsrctype>article</rsrctype><creationdate>2000</creationdate><recordtype>article</recordtype><recordid>eNotj8FKxDAURYMoWEd3fkA-wNS85DVtlkNRp0PFYRjXIU1TqXRaSerCv7dFV5d7OVw4hNwDTwFQPu7320MqdYoFwAVJQGLOkKvskiScC2CohbgmNzF-LlVlCAnJaxt9oOXg7diPH3TqaFXS1-l7aKkdW1rNkR69HdipP_tlH_t5Cgt4S646O0R_958b8v78dCp3rH57qcptzZzQembOukwgtK3nIEF5h1wUiI2VKleusd5DLsBqK7qicYXmWjmOrShcljdCNnJDHv5-XZhiDL4zX6E_2_BjgJtV2qzSRmqzSstftFBIPg</recordid><startdate>20000801</startdate><enddate>20000801</enddate><creator>Lu, Yong-Feng</creator><creator>Song, Wen-Dong</creator><creator>Hong, Ming-Hui</creator><creator>Ren, Zhong-Min</creator><creator>Chen, Qiong</creator><creator>Chong, Tow-Chong</creator><scope>AAYXX</scope><scope>CITATION</scope></search><sort><creationdate>20000801</creationdate><title>Laser Cleaning of IC Mould and Its Real-Time Monitoring</title><author>Lu, Yong-Feng ; Song, Wen-Dong ; Hong, Ming-Hui ; Ren, Zhong-Min ; Chen, Qiong ; Chong, Tow-Chong</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-LOGICAL-c299t-cac5241dde01316ec402844ba3676cbaee1721a9a2f8bc89096c04d28c57b23b3</frbrgroupid><rsrctype>articles</rsrctype><prefilter>articles</prefilter><language>eng</language><creationdate>2000</creationdate><toplevel>peer_reviewed</toplevel><toplevel>online_resources</toplevel><creatorcontrib>Lu, Yong-Feng</creatorcontrib><creatorcontrib>Song, Wen-Dong</creatorcontrib><creatorcontrib>Hong, Ming-Hui</creatorcontrib><creatorcontrib>Ren, Zhong-Min</creatorcontrib><creatorcontrib>Chen, Qiong</creatorcontrib><creatorcontrib>Chong, Tow-Chong</creatorcontrib><collection>CrossRef</collection><jtitle>Japanese Journal of Applied Physics</jtitle></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext</fulltext></delivery><addata><au>Lu, Yong-Feng</au><au>Song, Wen-Dong</au><au>Hong, Ming-Hui</au><au>Ren, Zhong-Min</au><au>Chen, Qiong</au><au>Chong, Tow-Chong</au><format>journal</format><genre>article</genre><ristype>JOUR</ristype><atitle>Laser Cleaning of IC Mould and Its Real-Time Monitoring</atitle><jtitle>Japanese Journal of Applied Physics</jtitle><date>2000-08-01</date><risdate>2000</risdate><volume>39</volume><issue>8R</issue><spage>4811</spage><pages>4811-</pages><issn>0021-4922</issn><eissn>1347-4065</eissn><abstract>Laser-induced removal of organic contaminants on IC mould surfaces was studied both experimentally and theoretically. The mould surfaces before and after cleaning were observed under an optical microscope and analysed by Auger electron spectroscopy (AES). It was found that the contaminants in the irradiated area were effectively removed by pulsed laser irradiation at a laser fluence greater than the cleaning threshold of 100 mJ/cm
2
. The cleaning efficiency increases with increasing laser fluence and the damage threshold of the mould surfaces is about 1.05 J/cm
2
, which is in good agreement with the theoretical damage threshold. We also demonstrated that the acoustic wave detection in real-time can be used to both monitor the surface cleanness during the laser cleaning process and determine the cleaning threshold and cleaning efficiency.</abstract><doi>10.1143/JJAP.39.4811</doi></addata></record> |
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source | Institute of Physics IOPscience extra; Institute of Physics |
title | Laser Cleaning of IC Mould and Its Real-Time Monitoring |
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