ArF Chemically Amplified Positive Resist Based on Alicyclic Lactone Polymer

We developed alicyclic acrylates with a hydrophilic moiety for use as an ArF chemically amplified positive resist. These monomers have an alicyclic unit, a norbornyl group, and a hydrophilic group, such as a hydroxyl, ester, acetate, or γ-lactone group. The acrylate polymer having a γ-lactone unit,...

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Bibliographic Details
Published in:Japanese Journal of Applied Physics 2001-12, Vol.40 (12R), p.7162
Main Authors: Maeda, Katsumi, Nakano, Kaichiro, Iwasa, Shigeyuki, Hasegawa, Etsuo
Format: Article
Language:English
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Summary:We developed alicyclic acrylates with a hydrophilic moiety for use as an ArF chemically amplified positive resist. These monomers have an alicyclic unit, a norbornyl group, and a hydrophilic group, such as a hydroxyl, ester, acetate, or γ-lactone group. The acrylate polymer having a γ-lactone unit, 5-acryloyloxy-6-hydroxynorbornane-2-carboxylic 6-lactone, exhibited high thermal stability and high hydrophilicity. A chemically amplified positive resist composed of a terpolymer using the norbornyl acrylate with a lactone structure and a photoacid generator produced a fine resolution of a 0.12 µm L/S pattern at 16.3 mJ/cm 2 by ArF exposure. This resist also produced a contact hole resolution of 0.14 µm with a depth of focus of 0.5 µm and exhibited good dry-etching resistance. The oxide etching rate achieved when using the developed resist is 1.29 times that of using a novolac resist, and it produces no resist top roughness after etching.
ISSN:0021-4922
1347-4065
DOI:10.1143/JJAP.40.7162