Calibration Method for High-Density-Plasma Chemical Vapor Deposition Simulation

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Bibliographic Details
Published in:Japanese Journal of Applied Physics 2002, Vol.41 (Part 1, No. 4A), p.1974-1980
Main Authors: Kinoshita, Shigeru, Takagi, Shigeyuki, Yabuhara, Hidehiko, Nishimura, Hiroshi, Kawaguchi, Hideichi, Shigyo, Naoyuki
Format: Article
Language:English
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ISSN:0021-4922
1347-4065
DOI:10.1143/JJAP.41.1974