Particle Contamination Control Technology in Electron Beam Mask Writing System for Next-Generation Mask Fabrication

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Bibliographic Details
Published in:Japanese Journal of Applied Physics 2002, Vol.41 (Part 1, No. 9), p.5835-5840
Main Authors: Akeno, Kiminobu, Ogasawara, Munehiro, Ooki, Kenji, Tojo, Toru, Hirano, Ryoichi, Yoshitake, Shusuke, Toriumi, Masaki, Sekine, Akihiko, Takigawa, Tadahiko, Shinoda, Toshiki, Noguchi, Shigeru
Format: Article
Language:English
Online Access:Get full text
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ISSN:0021-4922
1347-4065
DOI:10.1143/JJAP.41.5835