New Nanometer T-Gate Fabricated by Thermally Reflowed Resist Technique

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Bibliographic Details
Published in:Japanese Journal of Applied Physics 2002-12, Vol.41 (Part 2, No. 12B), p.L1508-L1510
Main Authors: Lee, Huang-Ming, Chang, Edward Yi, Chen, Szu-Hung, Chang, Chun-Yen
Format: Article
Language:English
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ISSN:0021-4922
DOI:10.1143/JJAP.41.L1508