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A Dual BARC method for Lithography and Etch for Dual Damascene with Low K

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Bibliographic Details
Published in:Japanese Journal of Applied Physics 2003-05, Vol.42 (Part 1, No. 5A), p.2649-2653
Main Authors: Roy, Moitreyee, Bliznetsov, Vladimir, Samudra, Ganesh
Format: Article
Language:English
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ISSN:0021-4922
1347-4065
DOI:10.1143/JJAP.42.2649