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A Dual BARC method for Lithography and Etch for Dual Damascene with Low K
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Published in: | Japanese Journal of Applied Physics 2003-05, Vol.42 (Part 1, No. 5A), p.2649-2653 |
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Main Authors: | , , |
Format: | Article |
Language: | English |
Citations: | Items that cite this one |
Online Access: | Get full text |
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ISSN: | 0021-4922 1347-4065 |
DOI: | 10.1143/JJAP.42.2649 |