Transformation of Dense Contact Holes during SiO 2 Etching

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Bibliographic Details
Published in:Japanese Journal of Applied Physics 2003-06, Vol.42 (Part 1, No. 6B), p.3962-3965
Main Authors: Sakamori, Shigenori, Fujiwara, Nobuo, Miyatake, Hiroshi, Oikawa, Kota, Yamanaka, Michinari, Sasaki, Tomoyuki
Format: Article
Language:English
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ISSN:0021-4922
1347-4065
DOI:10.1143/JJAP.42.3962