Transformation of Dense Contact Holes during SiO 2 Etching

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Published in:Japanese Journal of Applied Physics 2003-06, Vol.42 (Part 1, No. 6B), p.3962-3965
Main Authors: Sakamori, Shigenori, Fujiwara, Nobuo, Miyatake, Hiroshi, Oikawa, Kota, Yamanaka, Michinari, Sasaki, Tomoyuki
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Language:English
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container_end_page 3965
container_issue Part 1, No. 6B
container_start_page 3962
container_title Japanese Journal of Applied Physics
container_volume 42
creator Sakamori, Shigenori
Fujiwara, Nobuo
Miyatake, Hiroshi
Oikawa, Kota
Yamanaka, Michinari
Sasaki, Tomoyuki
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doi_str_mv 10.1143/JJAP.42.3962
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source IOPscience extra; Institute of Physics:Jisc Collections:IOP Publishing Read and Publish 2024-2025 (Reading List)
title Transformation of Dense Contact Holes during SiO 2 Etching
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