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Physical and Barrier Properties of Plasma-Enhanced Chemical Vapor Deposited α-SiCN:H Films with Different Hydrogen Contents

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Bibliographic Details
Published in:	Japanese Journal of Applied Physics 2003, Vol.42 (Part 1, No. 8), p.5246-5250
Main Authors:	Chiang, Chiu-Chih, Chen, Mao-Chieh, Ko, Chung-Chi, Jang, Syun-Ming, Yu, Chen-Hua, Liang, Mong-Song
Format:	Article
Language:	English
Citations:	Items that cite this one
Online Access:	Get full text
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