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T 4 Site Adsorption of Tl Atoms in a Si(111)-(1× 1)-Tl Structure, Determined by Low-Energy Electron Diffraction Analysis
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Published in: | Japanese Journal of Applied Physics 2003-03, Vol.42 (Part 2, No. 3B), p.L319-L321 |
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Main Authors: | , , , |
Format: | Article |
Language: | English |
Citations: | Items that cite this one |
Online Access: | Get full text |
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ISSN: | 0021-4922 |
DOI: | 10.1143/JJAP.42.L319 |