Loading…
Electronic Structures of CF 3 - for Studying Dissociative Electron Attachment to CF 3 Radicals
To elucidate the process of dissociative electron attachment (DA) to CF 3 radicals, the potential energy surfaces of CF 3 , CF 3 - and the electronic state CF 3 -* temporally produced in DA are calculated at the MP2/6-311++G** level by Gaussian 98. The electron affinities ( E A ) of the CF 3 , vibra...
Saved in:
Published in: | Japanese Journal of Applied Physics 2004-05, Vol.43 (5R), p.2711 |
---|---|
Main Author: | |
Format: | Article |
Language: | English |
Citations: | Items that this one cites Items that cite this one |
Online Access: | Get full text |
Tags: |
Add Tag
No Tags, Be the first to tag this record!
|
cited_by | cdi_FETCH-LOGICAL-c801-6faabe4dd2a8de185789364aa0fd701832bb3447cbb2c203edbdbef7c6d430ae3 |
---|---|
cites | cdi_FETCH-LOGICAL-c801-6faabe4dd2a8de185789364aa0fd701832bb3447cbb2c203edbdbef7c6d430ae3 |
container_end_page | |
container_issue | 5R |
container_start_page | 2711 |
container_title | Japanese Journal of Applied Physics |
container_volume | 43 |
creator | Hayashi, Daiyu |
description | To elucidate the process of dissociative electron attachment (DA) to CF
3
radicals, the potential energy surfaces of CF
3
, CF
3
-
and the electronic state CF
3
-*
temporally produced in DA are calculated at the MP2/6-311++G** level by Gaussian 98. The electron affinities (
E
A
) of the CF
3
, vibrational frequencies of CF
3
and CF
3
-
are also calculated. Our results are in good agreement with the experimental values (cf.
E
A
=1.72 eV, experimental value = 1.7±0.2 eV). It is elucidated that the electron capture by CF
3
under the adiabatic approximation occurs by the incident of a low-kinetic energy (∼0.6 eV) electron. DA to CF
3
is a slightly endothermic process with 0.2–0.4 eV. It is concluded that CF
3
radicals produce F
-
ions via DA with low kinetic energies. This process is considered to be very important in the kinetics of low-energy electrons in fluorocarbon plasmas. |
doi_str_mv | 10.1143/JJAP.43.2711 |
format | article |
fullrecord | <record><control><sourceid>crossref</sourceid><recordid>TN_cdi_crossref_primary_10_1143_JJAP_43_2711</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><sourcerecordid>10_1143_JJAP_43_2711</sourcerecordid><originalsourceid>FETCH-LOGICAL-c801-6faabe4dd2a8de185789364aa0fd701832bb3447cbb2c203edbdbef7c6d430ae3</originalsourceid><addsrcrecordid>eNo1kN1KwzAAhYMoWKd3PkAewMz8tekuS92mY6Dori351cjWSJIKe3tbplcfh8M5Fx8AtwTPCeHsfrNpXuaczakg5AwUhHGBOK7Kc1BgTAniC0ovwVVKX2OsSk4K8L7cW51j6L2GbzkOOg_RJhgcbFeQQQRdiGMxmKPvP-CDTyloL7P_sfB_CZucpf482D7DHE67V2m8lvt0DS7cCHvzxxnYrZa79hFtn9dPbbNFusYEVU5KZbkxVNbGkroU9YJVXErsjMCkZlQpxrnQSlFNMbNGGWWd0JXhDEvLZuDudKtjSCla131Hf5Dx2BHcTWq6SU03clLDfgHglFcL</addsrcrecordid><sourcetype>Aggregation Database</sourcetype><iscdi>true</iscdi><recordtype>article</recordtype></control><display><type>article</type><title>Electronic Structures of CF 3 - for Studying Dissociative Electron Attachment to CF 3 Radicals</title><source>Institute of Physics IOPscience extra</source><source>Institute of Physics:Jisc Collections:IOP Publishing Read and Publish 2024-2025 (Reading List)</source><creator>Hayashi, Daiyu</creator><creatorcontrib>Hayashi, Daiyu</creatorcontrib><description>To elucidate the process of dissociative electron attachment (DA) to CF
3
radicals, the potential energy surfaces of CF
3
, CF
3
-
and the electronic state CF
3
-*
temporally produced in DA are calculated at the MP2/6-311++G** level by Gaussian 98. The electron affinities (
E
A
) of the CF
3
, vibrational frequencies of CF
3
and CF
3
-
are also calculated. Our results are in good agreement with the experimental values (cf.
E
A
=1.72 eV, experimental value = 1.7±0.2 eV). It is elucidated that the electron capture by CF
3
under the adiabatic approximation occurs by the incident of a low-kinetic energy (∼0.6 eV) electron. DA to CF
3
is a slightly endothermic process with 0.2–0.4 eV. It is concluded that CF
3
radicals produce F
-
ions via DA with low kinetic energies. This process is considered to be very important in the kinetics of low-energy electrons in fluorocarbon plasmas.</description><identifier>ISSN: 0021-4922</identifier><identifier>EISSN: 1347-4065</identifier><identifier>DOI: 10.1143/JJAP.43.2711</identifier><language>eng</language><ispartof>Japanese Journal of Applied Physics, 2004-05, Vol.43 (5R), p.2711</ispartof><lds50>peer_reviewed</lds50><woscitedreferencessubscribed>false</woscitedreferencessubscribed><citedby>FETCH-LOGICAL-c801-6faabe4dd2a8de185789364aa0fd701832bb3447cbb2c203edbdbef7c6d430ae3</citedby><cites>FETCH-LOGICAL-c801-6faabe4dd2a8de185789364aa0fd701832bb3447cbb2c203edbdbef7c6d430ae3</cites></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><link.rule.ids>314,780,784,27923,27924</link.rule.ids></links><search><creatorcontrib>Hayashi, Daiyu</creatorcontrib><title>Electronic Structures of CF 3 - for Studying Dissociative Electron Attachment to CF 3 Radicals</title><title>Japanese Journal of Applied Physics</title><description>To elucidate the process of dissociative electron attachment (DA) to CF
3
radicals, the potential energy surfaces of CF
3
, CF
3
-
and the electronic state CF
3
-*
temporally produced in DA are calculated at the MP2/6-311++G** level by Gaussian 98. The electron affinities (
E
A
) of the CF
3
, vibrational frequencies of CF
3
and CF
3
-
are also calculated. Our results are in good agreement with the experimental values (cf.
E
A
=1.72 eV, experimental value = 1.7±0.2 eV). It is elucidated that the electron capture by CF
3
under the adiabatic approximation occurs by the incident of a low-kinetic energy (∼0.6 eV) electron. DA to CF
3
is a slightly endothermic process with 0.2–0.4 eV. It is concluded that CF
3
radicals produce F
-
ions via DA with low kinetic energies. This process is considered to be very important in the kinetics of low-energy electrons in fluorocarbon plasmas.</description><issn>0021-4922</issn><issn>1347-4065</issn><fulltext>true</fulltext><rsrctype>article</rsrctype><creationdate>2004</creationdate><recordtype>article</recordtype><recordid>eNo1kN1KwzAAhYMoWKd3PkAewMz8tekuS92mY6Dori351cjWSJIKe3tbplcfh8M5Fx8AtwTPCeHsfrNpXuaczakg5AwUhHGBOK7Kc1BgTAniC0ovwVVKX2OsSk4K8L7cW51j6L2GbzkOOg_RJhgcbFeQQQRdiGMxmKPvP-CDTyloL7P_sfB_CZucpf482D7DHE67V2m8lvt0DS7cCHvzxxnYrZa79hFtn9dPbbNFusYEVU5KZbkxVNbGkroU9YJVXErsjMCkZlQpxrnQSlFNMbNGGWWd0JXhDEvLZuDudKtjSCla131Hf5Dx2BHcTWq6SU03clLDfgHglFcL</recordid><startdate>20040501</startdate><enddate>20040501</enddate><creator>Hayashi, Daiyu</creator><scope>AAYXX</scope><scope>CITATION</scope></search><sort><creationdate>20040501</creationdate><title>Electronic Structures of CF 3 - for Studying Dissociative Electron Attachment to CF 3 Radicals</title><author>Hayashi, Daiyu</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-LOGICAL-c801-6faabe4dd2a8de185789364aa0fd701832bb3447cbb2c203edbdbef7c6d430ae3</frbrgroupid><rsrctype>articles</rsrctype><prefilter>articles</prefilter><language>eng</language><creationdate>2004</creationdate><toplevel>peer_reviewed</toplevel><toplevel>online_resources</toplevel><creatorcontrib>Hayashi, Daiyu</creatorcontrib><collection>CrossRef</collection><jtitle>Japanese Journal of Applied Physics</jtitle></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext</fulltext></delivery><addata><au>Hayashi, Daiyu</au><format>journal</format><genre>article</genre><ristype>JOUR</ristype><atitle>Electronic Structures of CF 3 - for Studying Dissociative Electron Attachment to CF 3 Radicals</atitle><jtitle>Japanese Journal of Applied Physics</jtitle><date>2004-05-01</date><risdate>2004</risdate><volume>43</volume><issue>5R</issue><spage>2711</spage><pages>2711-</pages><issn>0021-4922</issn><eissn>1347-4065</eissn><abstract>To elucidate the process of dissociative electron attachment (DA) to CF
3
radicals, the potential energy surfaces of CF
3
, CF
3
-
and the electronic state CF
3
-*
temporally produced in DA are calculated at the MP2/6-311++G** level by Gaussian 98. The electron affinities (
E
A
) of the CF
3
, vibrational frequencies of CF
3
and CF
3
-
are also calculated. Our results are in good agreement with the experimental values (cf.
E
A
=1.72 eV, experimental value = 1.7±0.2 eV). It is elucidated that the electron capture by CF
3
under the adiabatic approximation occurs by the incident of a low-kinetic energy (∼0.6 eV) electron. DA to CF
3
is a slightly endothermic process with 0.2–0.4 eV. It is concluded that CF
3
radicals produce F
-
ions via DA with low kinetic energies. This process is considered to be very important in the kinetics of low-energy electrons in fluorocarbon plasmas.</abstract><doi>10.1143/JJAP.43.2711</doi></addata></record> |
fulltext | fulltext |
identifier | ISSN: 0021-4922 |
ispartof | Japanese Journal of Applied Physics, 2004-05, Vol.43 (5R), p.2711 |
issn | 0021-4922 1347-4065 |
language | eng |
recordid | cdi_crossref_primary_10_1143_JJAP_43_2711 |
source | Institute of Physics IOPscience extra; Institute of Physics:Jisc Collections:IOP Publishing Read and Publish 2024-2025 (Reading List) |
title | Electronic Structures of CF 3 - for Studying Dissociative Electron Attachment to CF 3 Radicals |
url | http://sfxeu10.hosted.exlibrisgroup.com/loughborough?ctx_ver=Z39.88-2004&ctx_enc=info:ofi/enc:UTF-8&ctx_tim=2025-01-10T08%3A58%3A48IST&url_ver=Z39.88-2004&url_ctx_fmt=infofi/fmt:kev:mtx:ctx&rfr_id=info:sid/primo.exlibrisgroup.com:primo3-Article-crossref&rft_val_fmt=info:ofi/fmt:kev:mtx:journal&rft.genre=article&rft.atitle=Electronic%20Structures%20of%20CF%203%20-%20for%20Studying%20Dissociative%20Electron%20Attachment%20to%20CF%203%20Radicals&rft.jtitle=Japanese%20Journal%20of%20Applied%20Physics&rft.au=Hayashi,%20Daiyu&rft.date=2004-05-01&rft.volume=43&rft.issue=5R&rft.spage=2711&rft.pages=2711-&rft.issn=0021-4922&rft.eissn=1347-4065&rft_id=info:doi/10.1143/JJAP.43.2711&rft_dat=%3Ccrossref%3E10_1143_JJAP_43_2711%3C/crossref%3E%3Cgrp_id%3Ecdi_FETCH-LOGICAL-c801-6faabe4dd2a8de185789364aa0fd701832bb3447cbb2c203edbdbef7c6d430ae3%3C/grp_id%3E%3Coa%3E%3C/oa%3E%3Curl%3E%3C/url%3E&rft_id=info:oai/&rft_id=info:pmid/&rfr_iscdi=true |