Atomic Force Microscope Cantilever Array for Parallel Lithography of Quantum Devices

Arrayed atomic force microscope (AFM) cantilevers for parallel scanning probe lithography (SPL) have been fabricated by silicon micromachining. Fabrication is based on three KOH etching steps and local oxidation processes. The curvature radius of the tips is as sharp as 20 nm. A laser beam focused o...

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Bibliographic Details
Published in:Japanese Journal of Applied Physics 2004-06, Vol.43 (6S), p.4041
Main Authors: Kakushima, Kuniyuki, Watanabe, Toshiyuki, Shimamoto, Kouji, Gouda, Takushi, Ataka, Manabu, Mimura, Hidenori, Isono, Yoshimasa, Hashiguchi, Gen, Mihara, Yutaka, Fujita, Hiroyuki
Format: Article
Language:English
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Summary:Arrayed atomic force microscope (AFM) cantilevers for parallel scanning probe lithography (SPL) have been fabricated by silicon micromachining. Fabrication is based on three KOH etching steps and local oxidation processes. The curvature radius of the tips is as sharp as 20 nm. A laser beam focused onto the middle probe enables us to observe the wafer for alignment and confirm the patterns after the SPL operation. Parallel SPL on N -octadecyltrimethoxysilane (ODS) self-assembled monolayer (SAM) films is susessfully demonstrated with five probes. Good alignment and homogeneity are obtained with simple operation. Parallel SPL for parallel quantum device fabrications is also reported.
ISSN:0021-4922
1347-4065
DOI:10.1143/JJAP.43.4041