Metal-Organic Chemical Vapor Deposition of HfO 2 by Alternating Supply of Tetrakis-Diethylamino-Hafnium and Remote-Plasma Oxygen

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Bibliographic Details
Published in:Japanese Journal of Applied Physics 2004-10, Vol.43 (10), p.6963-6967
Main Authors: Horii, Sadayoshi, Yamamoto, Kazuhiko, Asai, Masayuki, Miya, Hironobu, Kaneko, Isao, Ishihara, Toshinobu, Hayashi, Shigenori, Niwa, Masaaki
Format: Article
Language:English
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ISSN:0021-4922
1347-4065
DOI:10.1143/JJAP.43.6963