Metal Organic Atomic Layer Deposition of Metal Silicate Film for High- k Gate Dielectrics

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Bibliographic Details
Published in:Japanese Journal of Applied Physics 2004-10, Vol.43 (No. 10A), p.L1296-L1298
Main Authors: Endo, Kazuhiko, Tatsumi, Toru
Format: Article
Language:English
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ISSN:0021-4922
DOI:10.1143/JJAP.43.L1296