Giant Vesicle Fusion on Microelectrodes Fabricated by Femtosecond Laser Ablation Followed by Synchrotron Radiation Etching

We have developed a new technique for fabricating a hole (well) with a diameter of about 1 µm for a microelectrode on the surface of SiO 2 (600 nm)/CoSi 2 (10 nm)/Si substrate. This process enabled the fabrication of electrode holes while maintaining the original nanolevel flatness ( R a ∼0.8 nm) of...

Full description

Saved in:
Bibliographic Details
Published in:Japanese Journal of Applied Physics 2005-01, Vol.44 (9L), p.L1207
Main Authors: Rahman, Md. Mashiur, Nonogaki, Youichi, Tero, Ryugo, Kim, Yong-Hoon, Uno, Hidetaka, Zhang, Zheng-Long, Yano, Takayuki, Aoyama, Masaki, Sasaki, Ryuichiro, Nagai, Hiroyuki, Yoshida, Makoto, Urisu, Tsuneo
Format: Article
Language:English
Citations: Items that this one cites
Items that cite this one
Online Access:Get full text
Tags: Add Tag
No Tags, Be the first to tag this record!
Description
Summary:We have developed a new technique for fabricating a hole (well) with a diameter of about 1 µm for a microelectrode on the surface of SiO 2 (600 nm)/CoSi 2 (10 nm)/Si substrate. This process enabled the fabrication of electrode holes while maintaining the original nanolevel flatness ( R a ∼0.8 nm) of the SiO 2 surface. A lipid bilayer was formed by giant vesicle fusion on these microelectrodes. Fluorescence microscope, in situ atomic force microscope and electrical characteristics measurements showed that a single lipid bilayer of sufficiently high resistance (gigaohm seal) was successfully fabricated.
ISSN:0021-4922
1347-4065
DOI:10.1143/JJAP.44.L1207