Loading…
Silicon-Based Solar Cell Fabricated by Metal-Induced Lateral Crystallization of Amorphous Silicon Film
Silicon-based polycrystalline solar cells are first fabricated by metal-induced lateral crystallization in which n-type polycrystalline-silicon (poly-Si) films, processed using nickel-induced amorphous silicon, are grown on p-silicon substrate at 550 °C by furnace annealing. The fabricated n-type po...
Saved in:
Published in: | Japanese Journal of Applied Physics 2006-10, Vol.45 (10R), p.7675 |
---|---|
Main Authors: | , , , , |
Format: | Article |
Language: | English |
Citations: | Items that this one cites Items that cite this one |
Online Access: | Get full text |
Tags: |
Add Tag
No Tags, Be the first to tag this record!
|
cited_by | cdi_FETCH-LOGICAL-c301t-d61be5c2d3d45d523278f11ead70353369aafca2fcb3913e7c167664364f440f3 |
---|---|
cites | cdi_FETCH-LOGICAL-c301t-d61be5c2d3d45d523278f11ead70353369aafca2fcb3913e7c167664364f440f3 |
container_end_page | |
container_issue | 10R |
container_start_page | 7675 |
container_title | Japanese Journal of Applied Physics |
container_volume | 45 |
creator | Hwang, Jun-Dar Chi, Tzu-Yi Liu, Jun-Chin Kung, Chung-Yuan Hsein, In-Cha |
description | Silicon-based polycrystalline solar cells are first fabricated by metal-induced lateral crystallization in which n-type polycrystalline-silicon (poly-Si) films, processed using nickel-induced amorphous silicon, are grown on p-silicon substrate at 550 °C by furnace annealing. The fabricated n-type poly-Si/p-substrate solar cell exhibits a conversion efficiency of 10.4% and an open-circuit voltage of 0.54 V without any passivation or antireflection coating layers. |
doi_str_mv | 10.1143/JJAP.45.7675 |
format | article |
fullrecord | <record><control><sourceid>crossref</sourceid><recordid>TN_cdi_crossref_primary_10_1143_JJAP_45_7675</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><sourcerecordid>10_1143_JJAP_45_7675</sourcerecordid><originalsourceid>FETCH-LOGICAL-c301t-d61be5c2d3d45d523278f11ead70353369aafca2fcb3913e7c167664364f440f3</originalsourceid><addsrcrecordid>eNotkMtOAjEYRhujiYjufIA-gMW2fy-yxIkgBKMJup50eok1hZJ2WODTO0RWX76zOIuD0D2jE8YEPK5Ws4-JkBOttLxAIwZCE0GVvEQjSjkjYsr5Nbqp9We4Sgo2QmETU7R5R55N9Q5vcjIFNz4lPDddidb0A-2O-M33JpHlzh3sANYDLibhphzrwFP8NX3MO5wDnm1z2X_nQ8VnM57HtL1FV8Gk6u_OO0Zf85fP5pWs3xfLZrYmFijriVOs89JyB05IJzlw_RQY88ZpChJATY0J1vBgO5gy8NoypZUSoEQQggYYo4d_ry251uJDuy9xa8qxZbQ9NWpPjVoh21Mj-APdFVoz</addsrcrecordid><sourcetype>Aggregation Database</sourcetype><iscdi>true</iscdi><recordtype>article</recordtype></control><display><type>article</type><title>Silicon-Based Solar Cell Fabricated by Metal-Induced Lateral Crystallization of Amorphous Silicon Film</title><source>Institute of Physics IOP Science Extra</source><source>Institute of Physics:Jisc Collections:IOP Publishing Read and Publish 2024-2025 (Reading List)</source><creator>Hwang, Jun-Dar ; Chi, Tzu-Yi ; Liu, Jun-Chin ; Kung, Chung-Yuan ; Hsein, In-Cha</creator><creatorcontrib>Hwang, Jun-Dar ; Chi, Tzu-Yi ; Liu, Jun-Chin ; Kung, Chung-Yuan ; Hsein, In-Cha</creatorcontrib><description>Silicon-based polycrystalline solar cells are first fabricated by metal-induced lateral crystallization in which n-type polycrystalline-silicon (poly-Si) films, processed using nickel-induced amorphous silicon, are grown on p-silicon substrate at 550 °C by furnace annealing. The fabricated n-type poly-Si/p-substrate solar cell exhibits a conversion efficiency of 10.4% and an open-circuit voltage of 0.54 V without any passivation or antireflection coating layers.</description><identifier>ISSN: 0021-4922</identifier><identifier>EISSN: 1347-4065</identifier><identifier>DOI: 10.1143/JJAP.45.7675</identifier><language>eng</language><ispartof>Japanese Journal of Applied Physics, 2006-10, Vol.45 (10R), p.7675</ispartof><lds50>peer_reviewed</lds50><woscitedreferencessubscribed>false</woscitedreferencessubscribed><citedby>FETCH-LOGICAL-c301t-d61be5c2d3d45d523278f11ead70353369aafca2fcb3913e7c167664364f440f3</citedby><cites>FETCH-LOGICAL-c301t-d61be5c2d3d45d523278f11ead70353369aafca2fcb3913e7c167664364f440f3</cites></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><link.rule.ids>314,780,784,27923,27924</link.rule.ids></links><search><creatorcontrib>Hwang, Jun-Dar</creatorcontrib><creatorcontrib>Chi, Tzu-Yi</creatorcontrib><creatorcontrib>Liu, Jun-Chin</creatorcontrib><creatorcontrib>Kung, Chung-Yuan</creatorcontrib><creatorcontrib>Hsein, In-Cha</creatorcontrib><title>Silicon-Based Solar Cell Fabricated by Metal-Induced Lateral Crystallization of Amorphous Silicon Film</title><title>Japanese Journal of Applied Physics</title><description>Silicon-based polycrystalline solar cells are first fabricated by metal-induced lateral crystallization in which n-type polycrystalline-silicon (poly-Si) films, processed using nickel-induced amorphous silicon, are grown on p-silicon substrate at 550 °C by furnace annealing. The fabricated n-type poly-Si/p-substrate solar cell exhibits a conversion efficiency of 10.4% and an open-circuit voltage of 0.54 V without any passivation or antireflection coating layers.</description><issn>0021-4922</issn><issn>1347-4065</issn><fulltext>true</fulltext><rsrctype>article</rsrctype><creationdate>2006</creationdate><recordtype>article</recordtype><recordid>eNotkMtOAjEYRhujiYjufIA-gMW2fy-yxIkgBKMJup50eok1hZJ2WODTO0RWX76zOIuD0D2jE8YEPK5Ws4-JkBOttLxAIwZCE0GVvEQjSjkjYsr5Nbqp9We4Sgo2QmETU7R5R55N9Q5vcjIFNz4lPDddidb0A-2O-M33JpHlzh3sANYDLibhphzrwFP8NX3MO5wDnm1z2X_nQ8VnM57HtL1FV8Gk6u_OO0Zf85fP5pWs3xfLZrYmFijriVOs89JyB05IJzlw_RQY88ZpChJATY0J1vBgO5gy8NoypZUSoEQQggYYo4d_ry251uJDuy9xa8qxZbQ9NWpPjVoh21Mj-APdFVoz</recordid><startdate>20061001</startdate><enddate>20061001</enddate><creator>Hwang, Jun-Dar</creator><creator>Chi, Tzu-Yi</creator><creator>Liu, Jun-Chin</creator><creator>Kung, Chung-Yuan</creator><creator>Hsein, In-Cha</creator><scope>AAYXX</scope><scope>CITATION</scope></search><sort><creationdate>20061001</creationdate><title>Silicon-Based Solar Cell Fabricated by Metal-Induced Lateral Crystallization of Amorphous Silicon Film</title><author>Hwang, Jun-Dar ; Chi, Tzu-Yi ; Liu, Jun-Chin ; Kung, Chung-Yuan ; Hsein, In-Cha</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-LOGICAL-c301t-d61be5c2d3d45d523278f11ead70353369aafca2fcb3913e7c167664364f440f3</frbrgroupid><rsrctype>articles</rsrctype><prefilter>articles</prefilter><language>eng</language><creationdate>2006</creationdate><toplevel>peer_reviewed</toplevel><toplevel>online_resources</toplevel><creatorcontrib>Hwang, Jun-Dar</creatorcontrib><creatorcontrib>Chi, Tzu-Yi</creatorcontrib><creatorcontrib>Liu, Jun-Chin</creatorcontrib><creatorcontrib>Kung, Chung-Yuan</creatorcontrib><creatorcontrib>Hsein, In-Cha</creatorcontrib><collection>CrossRef</collection><jtitle>Japanese Journal of Applied Physics</jtitle></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext</fulltext></delivery><addata><au>Hwang, Jun-Dar</au><au>Chi, Tzu-Yi</au><au>Liu, Jun-Chin</au><au>Kung, Chung-Yuan</au><au>Hsein, In-Cha</au><format>journal</format><genre>article</genre><ristype>JOUR</ristype><atitle>Silicon-Based Solar Cell Fabricated by Metal-Induced Lateral Crystallization of Amorphous Silicon Film</atitle><jtitle>Japanese Journal of Applied Physics</jtitle><date>2006-10-01</date><risdate>2006</risdate><volume>45</volume><issue>10R</issue><spage>7675</spage><pages>7675-</pages><issn>0021-4922</issn><eissn>1347-4065</eissn><abstract>Silicon-based polycrystalline solar cells are first fabricated by metal-induced lateral crystallization in which n-type polycrystalline-silicon (poly-Si) films, processed using nickel-induced amorphous silicon, are grown on p-silicon substrate at 550 °C by furnace annealing. The fabricated n-type poly-Si/p-substrate solar cell exhibits a conversion efficiency of 10.4% and an open-circuit voltage of 0.54 V without any passivation or antireflection coating layers.</abstract><doi>10.1143/JJAP.45.7675</doi></addata></record> |
fulltext | fulltext |
identifier | ISSN: 0021-4922 |
ispartof | Japanese Journal of Applied Physics, 2006-10, Vol.45 (10R), p.7675 |
issn | 0021-4922 1347-4065 |
language | eng |
recordid | cdi_crossref_primary_10_1143_JJAP_45_7675 |
source | Institute of Physics IOP Science Extra; Institute of Physics:Jisc Collections:IOP Publishing Read and Publish 2024-2025 (Reading List) |
title | Silicon-Based Solar Cell Fabricated by Metal-Induced Lateral Crystallization of Amorphous Silicon Film |
url | http://sfxeu10.hosted.exlibrisgroup.com/loughborough?ctx_ver=Z39.88-2004&ctx_enc=info:ofi/enc:UTF-8&ctx_tim=2025-01-12T01%3A39%3A54IST&url_ver=Z39.88-2004&url_ctx_fmt=infofi/fmt:kev:mtx:ctx&rfr_id=info:sid/primo.exlibrisgroup.com:primo3-Article-crossref&rft_val_fmt=info:ofi/fmt:kev:mtx:journal&rft.genre=article&rft.atitle=Silicon-Based%20Solar%20Cell%20Fabricated%20by%20Metal-Induced%20Lateral%20Crystallization%20of%20Amorphous%20Silicon%20Film&rft.jtitle=Japanese%20Journal%20of%20Applied%20Physics&rft.au=Hwang,%20Jun-Dar&rft.date=2006-10-01&rft.volume=45&rft.issue=10R&rft.spage=7675&rft.pages=7675-&rft.issn=0021-4922&rft.eissn=1347-4065&rft_id=info:doi/10.1143/JJAP.45.7675&rft_dat=%3Ccrossref%3E10_1143_JJAP_45_7675%3C/crossref%3E%3Cgrp_id%3Ecdi_FETCH-LOGICAL-c301t-d61be5c2d3d45d523278f11ead70353369aafca2fcb3913e7c167664364f440f3%3C/grp_id%3E%3Coa%3E%3C/oa%3E%3Curl%3E%3C/url%3E&rft_id=info:oai/&rft_id=info:pmid/&rfr_iscdi=true |