New Transparent Conducting Al-doped ZnO Film Preparation Techniques for Improving Resistivity Distribution in Magnetron Sputtering Deposition

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Bibliographic Details
Published in:Japanese Journal of Applied Physics 2006-04, Vol.45 (4L), p.L409
Main Authors: Minami, Tadatsugu, Miyata, Toshihiro, Ohtani, Yuusuke, Mochizuki, Yuu
Format: Article
Language:English
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ISSN:0021-4922
1347-4065
DOI:10.1143/JJAP.45.L409