Effect of Self-Biased Nitrous Oxide Plasma on Plasma-Enhanced Chemical-Vapor-Deposited Silicon Oxide

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Bibliographic Details
Published in:Japanese Journal of Applied Physics 2007-05, Vol.46 (5R), p.2887
Main Authors: Lin, Chiung-Wei, Chen, Yen-Xin, Lee, Yeong-Shyang, Yeh, Young-Hui
Format: Article
Language:English
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ISSN:0021-4922
1347-4065
DOI:10.1143/JJAP.46.2887