Which Mask is Preferred for Sub-60 nm Node Imaging?

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Bibliographic Details
Published in:Japanese Journal of Applied Physics 2007-09, Vol.46 (9S), p.6124
Main Authors: Kim, Sung-Hyuck, Kim, Soon-Ho, Kim, Yong-Hoon, Lee, Jeung-Woo, Woo, Sang-Gyun, Cho, Han-Ku, Oh, Hye-Keun
Format: Article
Language:English
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ISSN:0021-4922
1347-4065
DOI:10.1143/JJAP.46.6124