Critical Thickness of Strained Si on SiGe Bulk Virtual Substrate by Low-Pressure Chemical Vapor Deposition

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Bibliographic Details
Published in:Japanese Journal of Applied Physics 2007-10, Vol.46 (10R), p.6598
Main Authors: Senda, Takeshi, Igarashi, Masato, Izunome, Koji, Mitani, Shinichi
Format: Article
Language:English
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ISSN:0021-4922
1347-4065
DOI:10.1143/JJAP.46.6598