Hydrogenated Amorphous Silicon Layer Formation by Inductively Coupled Plasma Chemical Vapor Deposition and Its Application for Surface Passivation of p-Type Crystalline Silicon

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Bibliographic Details
Published in:Japanese Journal of Applied Physics 2009-06, Vol.48 (6R), p.66509
Main Authors: Dao, Vinh Ai, Duy, Nguyen Van, Heo, Jongkyu, Choi, Hyungwook, Kim, Youngkuk, Yi, Lakshminarayan
Format: Article
Language:English
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ISSN:0021-4922
1347-4065
DOI:10.1143/JJAP.48.066509