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Excess Capacitance Due to Minority Carrier Injection in CrSi 2 /p-Type Crystalline Si Isotype Junction
Excess current and capacitance phenonema were observed for the first time on a CrSi 2 /p-type crystalline silicon junction produced by cathodic arc physical vapor deposition. The heterojunction was investigated by current–voltage–temperature ( I – V – T ) and capacitance (conductance)–voltage/temper...
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Published in: | Japanese Journal of Applied Physics 2010-09, Vol.49 (9R), p.91302 |
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Main Authors: | , , , , |
Format: | Article |
Language: | English |
Citations: | Items that this one cites Items that cite this one |
Online Access: | Get full text |
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Summary: | Excess current and capacitance phenonema were observed for the first time on a CrSi
2
/p-type crystalline silicon junction produced by cathodic arc physical vapor deposition. The heterojunction was investigated by current–voltage–temperature (
I
–
V
–
T
) and capacitance (conductance)–voltage/temperature (
C
,
G
–
V
/
T
) measurements for the purpose of studying transport and storage features. Excess current, manifested as a crossover at a large forward bias, was observed in
I
–
V
–
T
curves since minority carriers injected into the quasi-neutral region of p-c-Si were neutralized by majority carriers supplied from the p-c-Si semiconductor side. This phenomenon, known as conductivity modulation, appeared distinctly as a hump in
C
–
V
/
T
curves (storage property); a sharp rise in capacitance towards a maximum value as forward bias increased and the subsequent fall after a specific value. For reverse and low forward bias regions, where minority carrier injection was negligible, geometrical junction capacitance and a shoulder in
C
–
V
/
T
curves were observed. In the voltage range where the peak was observed in
C
–
V
/
T
measurements, trap-assisted tunneling recombination generation and space-charge-limited current (SCLC) mechanisms were determined in the CrSi
2
/p-c-Si isotype junction. Traps introduced during tunneling were identified as bulk point defects due to the chromium–boron (Cr–B) complex for the CrSi
2
/p-c-Si junction on the Si side by
I
–
V
–
T
and
C
(
G
)–
T
analyses. This finding seemed to be in agreement with a recent DLTS [Deep Level Transient Spectroscopy] measurement in terms of both energy depth (0.26 eV) and bulk nature. Finally, the shoulder in
C
–
V
/
T
curves indicated Cr–B point defects in the measurement. |
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ISSN: | 0021-4922 1347-4065 |
DOI: | 10.1143/JJAP.49.091302 |