Large-Area Nanotemplate Process and Its Application to Roll Imprint

This study developed a stitching process for unit element nanotemplates based on step and repeat imprinting for use in enlarged soft mold fabrication. This mold was subsequently used for the custom-developed roll-to-plate UV nanoimprint process. The distinctive features of roll UV imprinting include...

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Bibliographic Details
Published in:Japanese Journal of Applied Physics 2012-06, Vol.51 (6), p.06FJ01-06FJ01-5
Main Authors: Choi, Jun-Hyuk, Lee, Soon-Won, Lee, Ji-Hye, Choi, Dae-Geun, Jeong, Jun-Ho, Lee, Eung-Sug
Format: Article
Language:English
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Summary:This study developed a stitching process for unit element nanotemplates based on step and repeat imprinting for use in enlarged soft mold fabrication. This mold was subsequently used for the custom-developed roll-to-plate UV nanoimprint process. The distinctive features of roll UV imprinting include the following: (1) the UV source is embedded within a roll mold made of quartz so that it can illuminate a resist coated on either a transparent or an opaque substrate, (2) the press-contact between the resist and soft mold wrapped around the quartz mold was designed to synchronize the rolling operation with the linear motion of the substrate, which helped minimize the residue thickness, and (3) a compressed pneumatic force was applied along the contact line of the roll imprint, which helped attenuate any possible level mismatch on the stitched mold surface.
ISSN:0021-4922
1347-4065
DOI:10.1143/JJAP.51.06FJ01