Application of Solid Immersion Lens-Based Near-Field Recording Technology to High-Speed Plasmonic Nanolithography

• Published in: Japanese Journal of Applied Physics 2012-08, Vol.51 (8), p.08JF01-08JF01-7
• Main Authors: Park, Kyoung-Su, Kim, Taeseob, Lee, Won-Sup, Joe, Hang-Eun, Min, Byung-Kwon, Park, Young-Pil, Yang, Hyunseok, Kang, Sung-Mook, Park, No-Cheol
• Format: Article
• Language: English
• ISSN: 0021-4922; 1347-4065
• DOI: 10.1143/JJAP.51.08JF01

In this paper, we proposed a high-speed and high-throughput plasmonic nanolithography technique that uses a fabricated sharp-ridged nanoaperture on a solid immersion lens (SIL) and a precise active nanogap control algorithm. This plasmonic lithography with high throughput can make an optical spot with a diameter of the order of 10 nm and can perform nanopatterning at sub-m/s speed. An optical high-throughput head was designed on a metallic aluminum aperture by optimizing the geometric parameters of a sharp-ridged antenna on the basis of the optical intensity and spot size. Using the evanescent field generated from the SIL, the plasmonic SIL could be maintained below 20 nm above a photoresist-coated Si-wafer and could move at a speed of greater than 200 mm/s without friction; the patterning of lines could be performed under this condition. We achieved patterning with a line width (full-width at half-magnitude, FWHM) of 130 nm.