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Developer-induced debonding of photoresist from copper

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Bibliographic Details
Published in:	IBM journal of research and development 1988-09, Vol.32 (5), p.631-635
Main Authors:	RUOFF, A. L, KRAMER, E. J, CHE-YU LI
Format:	Article
Language:	English
Subjects:	Applied sciences Electrical, magnetic and optical properties Exact sciences and technology Physical properties Polymer industry, paints, wood Properties and testing Technology of polymers
Citations:	Items that cite this one
Online Access:	Get full text
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