X-ray lithography beamlines in the IBM Advanced Lithography Facility

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Bibliographic Details
Published in:IBM journal of research and development 1993-05, Vol.37 (3), p.395-410
Main Authors: Silverman, J. P., Rippstein, R. P., Oberschmidt, J. M.
Format: Article
Language:English
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ISSN:0018-8646
0018-8646
DOI:10.1147/rd.373.0395