Intrinsic Gate Capacitances of n-type Junctionless Nanowire Transistors Using a Three-Dimensional Device Simulation and Experimental Measurements

Junctionless Nanowire transistors have been recently proposed as an alternative to overcome the short channel effect caused by the reduction of the transistors dimensions. These devices behave like a gated resistor due to the lack of the p-n junctions in the channel/ source and channel/drain regions...

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Bibliographic Details
Main Authors: Mariniello, G., Doria, R. T., Trevisoli, R. D., de Souza, M., Pavanello, M. A.
Format: Conference Proceeding
Language:English
Online Access:Get full text
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Summary:Junctionless Nanowire transistors have been recently proposed as an alternative to overcome the short channel effect caused by the reduction of the transistors dimensions. These devices behave like a gated resistor due to the lack of the p-n junctions in the channel/ source and channel/drain regions. The influence of doping concentration, silicon width, silicon height and gate oxide thickness on the intrinsic gate capacitances are presented in this paper by using three-dimensional numerical simulations and experimental results of fabricated devices. Also the influence of the applied drain bias in the components of the intrinsic gate capacitances is addressed.
ISSN:1938-5862
1938-6737
DOI:10.1149/04901.0231ecst