Monitoring of Polymer Removal Process for Copper Interconnect

Transition of interconnect technology to copper elevated challenges for polymer removal. Electrolyte has to provide efficient removal of organic material while preserving Cu surface with controlled regrowth of copper oxide. Spectroscopy in combination with electrochemical method can provide comprehe...

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Bibliographic Details
Published in:ECS transactions 2013-08, Vol.58 (6), p.159-167
Main Authors: Shalyt, Eugene, Liang, Guang, Wang, Jingjing, Pavlov, Michael, Dozortsev, Vladimir, Bai, Chuannan, Bratin, Peter
Format: Article
Language:English
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Summary:Transition of interconnect technology to copper elevated challenges for polymer removal. Electrolyte has to provide efficient removal of organic material while preserving Cu surface with controlled regrowth of copper oxide. Spectroscopy in combination with electrochemical method can provide comprehensive characterization of electrolyte for concentration of major components (H2O2, H2O, organic, pH). In addition, local electrochemical analysis provides information on copper oxide removal/regrowth.
ISSN:1938-5862
1938-6737
DOI:10.1149/05806.0159ecst