Spatial Atmospheric ALD of Functional Layers for CIGS Solar Cells

Spatial Atmospheric Atomic Layer Deposition combines the advantages of temporal ALD, i.e. excellent control of film composition and uniformity over large area substrates, with high growth rates (up to nm/s). In this paper we present a short overview of our research activity carried out on S-ALD of f...

Full description

Saved in:
Bibliographic Details
Published in:ECS transactions 2015-09, Vol.69 (7), p.31-37
Main Authors: Illiberi, A., Frijters, Corne, Balder, Ellis, Poodt, Paul, Roozeboom, Fred
Format: Article
Language:English
Citations: Items that cite this one
Online Access:Get full text
Tags: Add Tag
No Tags, Be the first to tag this record!
Description
Summary:Spatial Atmospheric Atomic Layer Deposition combines the advantages of temporal ALD, i.e. excellent control of film composition and uniformity over large area substrates, with high growth rates (up to nm/s). In this paper we present a short overview of our research activity carried out on S-ALD of functional thin films for the front window of copper indium gallium di-selenide (CIGS) solar cells. Zn(O,S) and ZnO:Al are grown by co-injecting the vaporized precursors of the cationic (O, S) and anionic (Zn, Al) elements, respectively. An insight on the growth characteristics and properties of Zn(O,S) and ZnO:Al is presented.
ISSN:1938-5862
1938-6737
DOI:10.1149/06907.0031ecst