(Invited) Atomic Layer Deposition of Nanoalloys of Noble and Non-Noble Metals

• Published in: ECS transactions 2017-01, Vol.80 (3), p.97-106
• Main Authors: Ramachandran, Ranjith K., Dendooven, Jolien, Filez, Matthias, Galvita, Vladimir V., Poelman, Hilde, Solano, Eduardo, Minjauw, Matthias M., Marin, Guy B., Detavernier, Christophe
• Format: Article
• Language: English
• ISSN: 1938-5862; 1938-6737; 1938-6737; 1938-5862
• DOI: 10.1149/08003.0097ecst

We present a novel ALD-based approach for the synthesis of bimetallic materials consisting of a noble metal along with a non-noble metal such as Pt-M (M = In, Ga, Sn, etc.), with a precise control on the composition and size. First, a bilayer consisting of a metal oxide and a Pt film of the desired thickness is deposited on to the substrate. The film is then subjected to a temperature programmed reduction (TPR) under H2 atmosphere. In situ X-ray diffraction (XRD) measurements during TPR revealed the formation of Pt-M bimetallic alloys with a phase determined by the Pt/(Pt + M) atomic ratio of the as-deposited bilayer. Scanning electron microscopic (SEM) analysis revealed the formation nanoparticles after annealing, with the particle size controlled by the initial total thickness of the bilayer.