Real-time reactive ion etch metrology techniques to enable in situ response surface process characterization

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Bibliographic Details
Published in:Journal of the Electrochemical Society 2001, Vol.148 (1), p.C34-C40
Main Authors: KLIMECKY, Pete, GARVIN, Craig, GALARZA, Cecilia G, STUTZMAN, Brooke S, KHARGONEKAR, Pramod P, TERRY, Fred L
Format: Article
Language:English
Subjects:
Cross-disciplinary physics: materials science
rheology
Deposition by sputtering
Exact sciences and technology
Materials science
Methods of deposition of films and coatings
film growth and epitaxy
Physics
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ISSN:0013-4651
1945-7111
DOI:10.1149/1.1344537