Effect of Post-Treatment Temperature on TiN Barrier Properties during a Two-Step Annealing for (Ba, Sr)TiO[sub 3] Dielectric Film

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Published in:Journal of the Electrochemical Society 2001, Vol.148 (5), p.F83
Main Authors: Yoon, Dong-Soo, Hong, Kwon, Roh, Jae Sung
Format: Article
Language:English
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title Effect of Post-Treatment Temperature on TiN Barrier Properties during a Two-Step Annealing for (Ba, Sr)TiO[sub 3] Dielectric Film
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