Ultraclean two-stage aerosol reactor for production of oxide-passivated silicon nanoparticles for novel memory devices

Saved in:
Bibliographic Details
Published in:Journal of the Electrochemical Society 2001, Vol.148 (5), p.G265-G270
Main Authors: OSTRAAT, Michele L, DE BLAUWE, Jan W, GREEN, Martin L, BELL, L. Douglas, ATWATER, Harry A, FLAGAN, Richard C
Format: Article
Language:English
Subjects:
Applied sciences
Electronics
Exact sciences and technology
Microelectronic fabrication (materials and surfaces technology)
Semiconductor electronics. Microelectronics. Optoelectronics. Solid state devices
Citations: Items that this one cites
Items that cite this one
Online Access:Get full text
Tags: Add Tag
No Tags, Be the first to tag this record!
Description
Summary:
ISSN:0013-4651
1945-7111
DOI:10.1149/1.1360210