Optimized process conditions for high quality gate oxides on SIMOX SOI substrates

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Bibliographic Details
Published in:Journal of the Electrochemical Society 1999, Vol.146 (1), p.281-285
Main Authors: SEO, J.-H, WOO, J. C, MASZARA, W. P
Format: Article
Language:English
Subjects:
Applied sciences
Electronics
Exact sciences and technology
Microelectronic fabrication (materials and surfaces technology)
Semiconductor electronics. Microelectronics. Optoelectronics. Solid state devices
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ISSN:0013-4651
1945-7111
DOI:10.1149/1.1391600