Optimized process conditions for high quality gate oxides on SIMOX SOI substrates

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Published in:Journal of the Electrochemical Society 1999, Vol.146 (1), p.281-285
Main Authors: SEO, J.-H, WOO, J. C, MASZARA, W. P
Format: Article
Language:English
Subjects:
Applied sciences
Electronics
Exact sciences and technology
Microelectronic fabrication (materials and surfaces technology)
Semiconductor electronics. Microelectronics. Optoelectronics. Solid state devices
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container_title Journal of the Electrochemical Society
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creator SEO, J.-H
WOO, J. C
MASZARA, W. P
description
doi_str_mv 10.1149/1.1391600
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source Institute of Physics:Jisc Collections:IOP Publishing Read and Publish 2024-2025 (Reading List)
subjects Applied sciences
Electronics
Exact sciences and technology
Microelectronic fabrication (materials and surfaces technology)
Semiconductor electronics. Microelectronics. Optoelectronics. Solid state devices
title Optimized process conditions for high quality gate oxides on SIMOX SOI substrates
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