Control of polysilicon surface topography in a high selectivity chemical mechanical polishing process

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Bibliographic Details
Published in:Journal of the Electrochemical Society 1999-03, Vol.146 (3), p.1158-1162
Main Authors: FANG, S. J, UKRAINTSEV, V. A, U, E, EDWARDS, H, STECKENRIDER, S
Format: Article
Language:English
Subjects:
Applied sciences
Cross-disciplinary physics: materials science
rheology
Electronics
Exact sciences and technology
Materials science
Microelectronic fabrication (materials and surfaces technology)
Physics
Semiconductor electronics. Microelectronics. Optoelectronics. Solid state devices
Surface treatments
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ISSN:0013-4651
1945-7111
DOI:10.1149/1.1391738