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Control of polysilicon surface topography in a high selectivity chemical mechanical polishing process

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Published in:	Journal of the Electrochemical Society 1999-03, Vol.146 (3), p.1158-1162
Main Authors:	FANG, S. J, UKRAINTSEV, V. A, U, E, EDWARDS, H, STECKENRIDER, S
Format:	Article
Language:	English
Subjects:	Applied sciences Cross-disciplinary physics: materials science rheology Electronics Exact sciences and technology Materials science Microelectronic fabrication (materials and surfaces technology) Physics Semiconductor electronics. Microelectronics. Optoelectronics. Solid state devices Surface treatments
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source	Institute of Physics
subjects	Applied sciences Cross-disciplinary physics: materials science rheology Electronics Exact sciences and technology Materials science Microelectronic fabrication (materials and surfaces technology) Physics Semiconductor electronics. Microelectronics. Optoelectronics. Solid state devices Surface treatments
title	Control of polysilicon surface topography in a high selectivity chemical mechanical polishing process
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