Trimethylchlorosilane treatment of ultralow dielectric constant material after photoresist removal processing

Saved in:
Bibliographic Details
Published in:Journal of the Electrochemical Society 2002-10, Vol.149 (10), p.F145-F148
Main Authors: CHANG, T. C, MOR, Y. S, LIU, P. T, TSAI, T. M, CHEN, C. W, CHU, C. J, PAN, F. M, LUR, W, SZE, S. M
Format: Article
Language:English
Subjects:
Cross-disciplinary physics: materials science
rheology
Exact sciences and technology
Materials science
Physics
Surface treatments
Citations: Items that this one cites
Items that cite this one
Online Access:Get full text
Tags: Add Tag
No Tags, Be the first to tag this record!
Description
Summary:
ISSN:0013-4651
1945-7111
DOI:10.1149/1.1504456