An investigation of particle dynamics in a rotating disk chemical vapor deposition reactor

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Bibliographic Details
Published in:Journal of the Electrochemical Society 2003-02, Vol.150 (2), p.G127-G139
Main Authors: KREMER, D. M, DAVIS, R. W, MOORE, E. F, MASLAR, J. E, BURGESS, D. R, EHRMAN, S. H
Format: Article
Language:English
Subjects:
Chemical vapor deposition (including plasma-enhanced cvd, mocvd, etc.)
Cross-disciplinary physics: materials science
rheology
Exact sciences and technology
Materials science
Methods of deposition of films and coatings
film growth and epitaxy
Physics
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ISSN:0013-4651
1945-7111
DOI:10.1149/1.1536180